Q.Suppose a pure Si crystal has 5×1028 atoms m−3. It is doped by 1 ppm concentration of pentavalent As. Calculate the number of electrons and holes. Given that ni=1.5×1016 m−3.
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🔒 Start your 14-day free trial to unlock the full solution →Concept understanding — Intrinsic Carrier Concentration
Intrinsic carrier concentration is a foundational idea in semiconductor physics — let’s build it from the ground up, with no prior knowledge of semiconductors needed.
1. Intuition: What does "intrinsic" mean?
Imagine a pure, perfect crystal of silicon — no impurities, no defects. At absolute zero temperature (0 K), all electrons are tightly bound in the crystal lattice. No current flows.
Now, heat it up. Thermal energy shakes the atoms. Some electrons gain enough energy to break free from their bonds. When an electron leaves, it leaves behind a hole — a missing electron that behaves like a positive charge.
In this pure crystal, every free electron comes from a broken bond, and every broken bond creates one hole. So:
Number of free electrons = Number of holes
This balance is the hallmark of an intrinsic semiconductor.
2. The precise definition
Intrinsic carrier concentration (ni) is the number of free electrons (or holes) per unit volume in a pure, undoped semiconductor at thermal equilibrium.
It is denoted by ni and has units of cm−3 or m−3.
Key points:
- It depends only on the material and temperature — not on doping.
- For silicon at room temperature (300 K):
ni≈1.5×1010 cm−3
- For germanium: ni≈2.5×1013 cm−3
- For gallium arsenide: ni≈1.8×106 cm−3
3. The formula (for exams)
The precise expression is:
ni=NcNv⋅e−Eg/(2kT)
Where:
- Nc = effective density of states in the conduction band
- Nv = effective density of states in the valence band
- Eg = bandgap energy (eV)
- k = Boltzmann constant (8.617×10−5 eV/K)
- T = absolute temperature (K)
Important: The exponential term e−Eg/(2kT) dominates — a small change in Eg or T causes a huge change in ni.
4. Why does it matter?
- It sets the baseline for all semiconductor devices. Doping increases one carrier type, but the product n⋅p=ni2 always holds at equilibrium.
- Temperature sensitivity: ni roughly doubles for every 10∘C rise in silicon. This is why circuits fail in heat. …
Why this formula?
Why Intrinsic Carrier Concentration Has That Formula
The intrinsic carrier concentration ni is the number of electrons (or holes) per unit volume in a pure, undoped semiconductor at thermal equilibrium. The formula you see in every textbook is:
ni=NcNve−Eg/2kT
where Nc and Nv are the effective density of states in the conduction and valence bands, Eg is the bandgap energy, k is Boltzmann's constant, and T is absolute temperature.
This isn't pulled from thin air. It comes from a simple physical balance: in an intrinsic semiconductor, every electron in the conduction band leaves behind a hole in the valence band. So the electron concentration n must equal the hole concentration p, and both equal ni.
Step 1: The electron and hole concentrations individually
Electrons in the conduction band follow Fermi-Dirac statistics. For non-degenerate semiconductors (which intrinsic ones are, since the Fermi level lies near midgap), the distribution approximates the Maxwell-Boltzmann tail:
n=Nce−(Ec−EF)/kT
Similarly, holes in the valence band:
p=Nve−(EF−Ev)/kT
Here Ec is the conduction band edge, Ev is the valence band edge, and EF is the Fermi level. The effective densities Nc and Nv come from integrating the density of states times the Boltzmann factor — they depend on the effective masses of electrons and holes and on temperature.
Step 2: The intrinsic condition
In an intrinsic semiconductor, there are no dopants. Every electron that jumps to the conduction band creates exactly one hole. So:
n=p
Set the two expressions equal:
Nce−(Ec−EF)/kT=Nve−(EF−Ev)/kT
Take natural logs and solve for EF:
−(Ec−EF)+lnNc=−(EF−Ev)+lnNv
EF=2Ec+Ev+2kTlnNcNv
The Fermi level in an intrinsic semiconductor sits very close to the middle of the bandgap, shifted slightly by the ratio Nv/Nc. For most practical purposes, it's at midgap.
Step 3: Multiply to eliminate EF
Now here's the clever part. Instead of solving for EF directly, multiply n and p:
np=NcNve−(Ec−EF)/kTe−(EF−Ev)/kT
The EF terms cancel:
np=NcNve−(Ec−Ev)/kT=NcNve−Eg/kT
This product np is a constant for a given material at a given temperature — it does not depend on the Fermi level. This is the law of mass action for semiconductors.
Step 4: Apply the intrinsic condition
Since n=p=ni in an intrinsic semiconductor:
ni2=NcNve−Eg/kT
Take the square root:
ni=NcNve−Eg/2kT …
Concept: Intrinsic Carrier Concentration — In an extrinsic semiconductor, the product n⋅p=ni2 always holds at equilibrium.
Step 1: Find donor concentration.
1 ppm means 1 As atom per 106 Si atoms.
ND=1065×1028=5×1022 m−3
Step 2: Approximate electron concentration.
Since ND≫ni, nearly all donors ionise:
n≈ND=5×1022 m−3
Step 3: Find hole concentration using mass action law. …
The key idea is that doping with a pentavalent impurity (As) adds donor electrons, making the crystal n-type. The electron concentration becomes approximately equal to the donor concentration, and the hole concentration is found using the mass-action law np=ni2. The final values are n≈5×1022 m−3 and p≈4.5×109 m−3.
Why this approach works
In a pure (intrinsic) semiconductor, the number of electrons equals the number of holes — both are ni. But when we dope with a pentavalent atom like arsenic (As), which has five valence electrons, four of them bond with neighbouring silicon atoms and the fifth becomes a free electron. This makes the crystal n-type, where electrons are the majority carriers and holes are the minority carriers.
The key principle is charge neutrality: the total positive charge must equal the total negative charge. In an n-type semiconductor at room temperature, almost all donor atoms are ionised, so the electron concentration n is essentially equal to the donor concentration ND. Then, using the mass-action law (np=ni2), we can find the hole concentration p.
Step-by-step calculation
1. Find the donor concentration from the doping level
We are told the crystal has 5×1028 Si atoms per cubic metre, and it is doped with 1 ppm (parts per million) of As. This means for every million Si atoms, there is one As atom.
So the donor concentration ND is:
ND=1061×(5×1028)=5×1022 atoms/m3
Since each As atom donates one free electron, ND is also the concentration of donor electrons (assuming full ionisation, which is valid at room temperature).
"1 ppm" here means 1 atom of impurity per 106 atoms of Si. Always check the context — in some problems ppm means parts per million by mass, but here it clearly refers to atomic concentration.
2. Determine the electron concentration
In an n-type semiconductor at room temperature, the electron concentration n is approximately equal to the donor concentration because the intrinsic carrier concentration ni is negligible compared to ND:
n≈ND=5×1022 m−3
Why "approximately"? Because a tiny fraction of electrons come from intrinsic generation, but ni=1.5×1016 m−3 is six orders of magnitude smaller than ND, so the approximation is excellent. …
Method: Mass Action Law for Extrinsic Semiconductors
This problem uses the mass action law combined with the charge neutrality condition for an n-type semiconductor.
Step 1 — Find the donor concentration
1 ppm means 1 atom of As per 106 atoms of Si. So:
ND=1065×1028=5×1022 m−3
Step 2 — Identify the majority carrier
Pentavalent As donates an extra electron. At room temperature, nearly all donor atoms are ionised. Since ND≫ni, the electron concentration is essentially equal to the donor concentration:
n≈ND=5×1022 m−3
Do not add ni to ND here — ni is 1.5×1016, which is six orders of magnitude smaller than ND. Adding it would be meaningless.
Step 3 — Apply the mass action law
For any semiconductor in thermal equilibrium:
n⋅p=ni2
So:
p=nni2=5×1022(1.5×1016)2 …
Common Mistakes & How to Avoid Them
Mistake 1: Confusing ppm with a percentage
Many students treat 1 ppm as 1% — that is, they multiply the atom density by 0.01 instead of 10−6. This gives a donor concentration that is four orders of magnitude too large, which then throws off every subsequent calculation.
How to avoid: Remember that "ppm" means parts per million, i.e., 1 ppm=1×10−6. So the donor concentration is:
ND=(5×1028)×(1×10−6)=5×1022 m−3
Never treat ppm as a percentage. Write 10−6 explicitly beside "ppm" in your working until it becomes automatic.
Mistake 2: Forgetting that ni is given in m−3, not cm−3
The problem gives ni=1.5×1016 m−3. Some students, used to the common textbook value 1.5×1010 cm−3, automatically convert or substitute the wrong number. This leads to a completely wrong hole concentration.
How to avoid: Always check the units of every given quantity before plugging into a formula. If the problem states m−3, keep everything in m−3. Do not "correct" the given data.
Mistake 3: Assuming n=ND without checking the doping regime
Students often write n=ND and p=ni2/ND without first verifying that ND≫ni. If ND were comparable to ni, the full quadratic equation would be needed.
How to avoid: Compare ND and ni explicitly. Here:
ND=5×1022 m−3,ni=1.5×1016 m−3
Since ND is about 3 million times larger than ni, the approximation n≈ND is excellent. Write this comparison in your solution — examiners look for it.
A quick check: if ND>100ni, the approximation is safe for most exam problems.
Mistake 4: Using the wrong mass-action law sign or forgetting it entirely
Some students try to find p by subtracting ni from ND, or by using n+p=constant. The only correct relation is:
n⋅p=ni2
How to avoid: Write the mass-action law before you calculate anything. It is the bridge between electron and hole concentrations in any doped semiconductor.
Mistake 5: Arithmetic errors in the final division …
- AP EAPCET 2025Set eng-2025-05-26-FN1 markMCQQ.At absolute zero temperature, an intrinsic semiconductor behaves as (A) conductor (B) superconductor (C) insulator (D) intrinsic semiconductor
›Reveal solutionSolution
An intrinsic semiconductor has no free charge carriers at absolute zero (no thermal energy to break covalent bonds), so it behaves exactly like an insulator.
Concept and Intuition
In an intrinsic (pure) semiconductor like Si or Ge, conduction electrons are created only when thermal energy breaks a covalent bond, promoting an electron from the valence band to the conduction band and leaving a hole behind. The number of such carriers depends strongly on temperature. At T=0K, there is no thermal energy available, so the valence band is completely full and the conduction band is completely empty — exactly the band picture of an insulator.
Step-by-Step Solution
- Carrier generation in an intrinsic semiconductor is thermally activated: ni∝e−Eg/2kBT.
- As T→0, ni→0 since the exponential term vanishes.
- Zero free carriers means zero conductivity, which is the defining behaviour of an insulator. …
- AP EAPCET 2024Set eng-2024-05-18-FN1 markMCQQ.If ne and nh are concentrations of electrons and holes in a semi-conductor, then the intrinsic carrier concentration (ni) in thermal equilibrium is (A) ni=ne/nh (B) ni=nenh (C) ni=nenh (D) ni=ne+nh
›Reveal solutionSolution
The intrinsic carrier concentration is the geometric mean of electron and hole concentrations — the semiconductor mass-action law.
Concept and Intuition
In thermal equilibrium (whether the material is intrinsic or doped), the product nenh stays constant at a given temperature and equals ni2 — this is the semiconductor analogue of the law of mass action, valid for both intrinsic and extrinsic semiconductors.
Step-by-Step Solution
- The mass-action law states nenh=ni2 at thermal equilibrium.
- Solving for ni: ni=nenh
Common Mistakes …
- AP EAPCET 2024Set eng-2024-05-21-AN1 markMCQQ.Pure silicon at 300 K has equal electron and hole concentration of 1.5×1016 m−3. If the hole concentration increases to 3×1022 m−3, then electron concentration in the silicon is (A) 0.75×109 m−3 (B) 750 m−3 (C) 75 m−3 (D) 7.5×109 m−3
›Reveal solutionSolution
Use the mass-action law for semiconductors, np=ni2, which holds regardless of doping. Answer: 7.5×109 m−3.
Concept and Intuition
In any semiconductor at thermal equilibrium, the product of electron and hole concentrations equals the square of the intrinsic carrier concentration: np=ni2. This law holds whether the material is intrinsic or doped, so doping that raises hole concentration must correspondingly lower electron concentration.
Step-by-Step Solution
- Intrinsic concentration: ni=1.5×1016 m−3, so ni2=2.25×1032 m−6.
- New hole concentration: p=3×1022 m−3. …
- AP EAPCET 2023Set eng-2023-05-16-FN1 markMCQQ.When the temperature of a semiconductor increases then (A) number of free electrons only increases (B) number of holes only increases (C) both number of free electrons and number of holes increase (D) both number of free electrons and number of holes decrease
›Reveal solutionSolution
This tests how thermal energy affects carrier concentration in a semiconductor. Answer: both electrons and holes increase with temperature.
Concept and Intuition
In an intrinsic (pure) semiconductor, conduction occurs because thermal energy breaks covalent bonds between atoms, freeing valence electrons to move into the conduction band. Each time an electron is freed this way, it leaves behind a vacancy in the bond — a hole — which itself behaves like a mobile positive charge carrier. Because electron-hole pairs are created together, increasing temperature always increases the concentrations of both types of carrier simultaneously (unlike in an extrinsic/doped semiconductor at intermediate temperatures, but even there, at higher temperatures intrinsic generation eventually dominates).
Step-by-Step Solution
- Semiconductors conduct via two types of charge carriers: free electrons (in the conduction band) and holes (vacancies in the valence band).
- Raising temperature increases the thermal energy available to break covalent bonds.
- Each broken bond generates one free electron and simultaneously leaves one hole — this is pair generation. …
- AP EAPCET 2023Set eng-2023-05-17-AN1 markMCQQ.The hole and the free electron concentrations in a pure silicon at room temperature are given by 1.4×1016 m−3 each under equilibrium. When it is doped with indium and the hole concentration is nh=4×1022 m−3, the electron concentration is (A) 0.49×1010 m−3 (B) 0.14×1010 m−3 (C) 0.36×1010 m−3 (D) 0.72×1010 m−3
›Reveal solutionSolution
Using the mass-action law nenh=ni2 (which holds in doped as well as intrinsic silicon at equilibrium), the electron concentration after indium doping is 0.49×1010 m−3.
Concept and Intuition
In any semiconductor at thermal equilibrium, the product of electron and hole concentrations equals the square of the intrinsic carrier concentration, nenh=ni2, regardless of doping (this is analogous to the equilibrium constant in a chemical reaction — doping shifts the individual concentrations but their product stays fixed by the material and temperature). Indium is a trivalent (acceptor) dopant, so doping with it creates a p-type semiconductor: it greatly increases the hole concentration nh far above ni, and correspondingly decreases the minority electron concentration ne far below ni, keeping the product constant.
Step-by-Step Solution
- Write the mass-action law: nenh=ni2. …
- AP EAPCET 2022Set eng-2022-07-04-AN1 markMCQQ.Consider the statements In a semi conductor (A) There are no free electrons at 0 K. (B) There are no free electrons at any temperature (C) The number of free electrons increases with temperature. (D) The number of free electrons is less than that in a conductor. (A) B, C, D are true but A is false (B) A, B, C are true but D is false (C) A, C, D are true but B is false. (D) A, B, C and D are all true.
›Reveal solutionSolution
Tests the band-theory picture of semiconductors: no carriers at 0 K, carrier density rises with temperature, and carrier density always stays below that of a true conductor.
Concept and Intuition
In a semiconductor, the valence band and conduction band are separated by a small energy gap (Eg∼1 eV for Si/Ge). At T=0 K there is no thermal energy to excite electrons across this gap, so the conduction band is empty and the material behaves as a perfect insulator. As T increases, a fraction of valence electrons (following a Boltzmann-like/Fermi-Dirac distribution) gain enough thermal energy to jump the gap, populating the conduction band and leaving holes behind — hence conductivity (and free-electron count) rises with temperature. This is fundamentally different from a metal, where the conduction band is either partially filled or overlaps the valence band, giving a very large free-electron density essentially independent of this gap-crossing mechanism, and always far larger than a semiconductor's.
Step-by-Step Solution
- Evaluate (A): No free electrons at 0 K — TRUE, because there's no thermal energy to promote electrons across the gap.
- Evaluate (B): No free electrons at any temperature — FALSE, because at T>0 some electrons do cross the gap.
- Evaluate (C): Number of free electrons increases with temperature — TRUE, directly from the thermal excitation mechanism. …
- AP EAPCET 2022Set eng-2022-07-07-AN1 markMCQQ.A pure semiconductor crystal has 8×1028m3atoms. It is doped by 2 ppm concentration of pentavalent atoms. The number of holes formed in the semiconductor crystal is (Intrinsic carrier concentration, ni=1×1016 m−3). (A) 4.5×109 m−3 (B) 6.25×108 m−3 (C) 2.5×109 m−3 (D) 1.25×108 m−3
›Reveal solutionSolution
Find the donor (electron) concentration from the doping fraction, then use the semiconductor mass-action law nenh=ni2 to get the hole concentration.
Concept and Intuition
Doping a semiconductor with pentavalent (donor) atoms creates extra free electrons roughly equal in number to the donor atom concentration (since each donor atom contributes one free electron and donor concentration vastly exceeds the intrinsic carrier concentration). The mass-action law, nenh=ni2, always holds regardless of doping, letting us find the (now minority) hole concentration.
Step-by-Step Solution
- Total atom density =8×1028m−3; doping level =2 ppm =2×10−6.
- Donor concentration ND=2×10−6×8×1028=1.6×1023m−3.
- Since ND≫ni(=1016), essentially all donors ionize and dominate: ne≈ND=1.6×1023m−3. …
- AP EAPCET 2021Set eng-2021-08-19-AN1 markMCQQ.The length of germanium rod is 0.925 cm and its area of cross section is 1 mm2. If for germanium ni=2.5×1019 m−3, μh=0.19 m2/v−s, μe=0.39 m2/v−s, then the resistance of the rod is ________ (A) 2.5 Ω (B) 4.0 Ω (C) 5.0 Ω (D) 10.0 Ω
›Reveal solutionSolution
Computing the intrinsic conductivity of germanium from ni, μe and μh, then the resistance from the given rod dimensions, gives a value whose leading digits (4.0) match option (B) and no other listed choice.
Concept and Intuition
For an intrinsic (undoped) semiconductor, both electrons and holes contribute to conduction, so the conductivity combines both carrier types: σ=nie(μe+μh), where ni is the intrinsic carrier concentration and μe,μh are the electron and hole mobilities. Once σ (hence resistivity ρ=1/σ) is known, an ordinary rod-resistance formula R=ρl/A gives the resistance from its physical dimensions.
Step-by-Step Solution
- Given: ni=2.5×1019 m−3, μe=0.39 m2/V⋅s, μh=0.19 m2/V⋅s, l=0.925 cm, A=1 mm².
- Conductivity: σ=nie(μe+μh)=(2.5×1019)(1.6×10−19)(0.58).
- nie=2.5×1.6=4.0 (the powers of ten cancel: 1019×10−19=1). So σ=4.0×0.58=2.32 S/m.
- Resistivity: ρ=1/σ=1/2.32≈0.431 Ω⋅m — this matches germanium's well-known intrinsic resistivity (~0.4–0.5 Ω⋅m at room temperature), confirming the numbers used are physically consistent. …
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