Q.The conductivity of a semiconductor increases with increase in temperature because
Concept understanding — Intrinsic Carrier Concentration
Intrinsic carrier concentration is a foundational idea in semiconductor physics — let’s build it from the ground up, with no prior knowledge of semiconductors needed.
1. Intuition: What does "intrinsic" mean?
Imagine a pure, perfect crystal of silicon — no impurities, no defects. At absolute zero temperature (0 K), all electrons are tightly bound in the crystal lattice. No current flows.
Now, heat it up. Thermal energy shakes the atoms. Some electrons gain enough energy to break free from their bonds. When an electron leaves, it leaves behind a hole — a missing electron that behaves like a positive charge.
In this pure crystal, every free electron comes from a broken bond, and every broken bond creates one hole. So:
Number of free electrons = Number of holes
This balance is the hallmark of an intrinsic semiconductor.
2. The precise definition
Intrinsic carrier concentration (ni) is the number of free electrons (or holes) per unit volume in a pure, undoped semiconductor at thermal equilibrium.
It is denoted by ni and has units of cm−3 or m−3.
Key points:
- It depends only on the material and temperature — not on doping.
- For silicon at room temperature (300 K):
ni≈1.5×1010 cm−3
- For germanium: ni≈2.5×1013 cm−3
- For gallium arsenide: ni≈1.8×106 cm−3
3. The formula (for exams)
The precise expression is:
ni=NcNv⋅e−Eg/(2kT)
Where:
- Nc = effective density of states in the conduction band
- Nv = effective density of states in the valence band
- Eg = bandgap energy (eV)
- k = Boltzmann constant (8.617×10−5 eV/K)
- T = absolute temperature (K)
Important: The exponential term e−Eg/(2kT) dominates — a small change in Eg or T causes a huge change in ni.
4. Why does it matter?
- It sets the baseline for all semiconductor devices. Doping increases one carrier type, but the product n⋅p=ni2 always holds at equilibrium.
- Temperature sensitivity: ni roughly doubles for every 10∘C rise in silicon. This is why circuits fail in heat.
- Device limits: In a p-n junction, leakage current depends on ni2.
5. Quick check for understanding
Question: If you heat a pure silicon crystal from 300 K to 400 K, what happens to ni?
Answer: It increases dramatically — the exponential term e−Eg/(2kT) becomes much larger because T is in the denominator of the exponent. For silicon, ni rises from ≈1.5×1010 to roughly ≈5×1012 cm−3 (about 2-3 orders of magnitude, not 4).
Bottom line: Intrinsic carrier concentration is the natural electron-hole population in a pure semiconductor — a fundamental property that governs all semiconductor behaviour.
"Intrinsic carrier concentration formula semiconductor" and "semiconductor electronics class 12 physics ncert" are commonly searched phrases, both anchored in the Semiconductor Electronics chapter of the NCERT/CBSE Class 12 Physics curriculum. This baseline electron-hole concentration also underlies several JEE Main and NEET p-n junction questions.
Why this formula?
Why Intrinsic Carrier Concentration Has That Formula
The intrinsic carrier concentration ni is the number of electrons (or holes) per unit volume in a pure, undoped semiconductor at thermal equilibrium. The formula you see in every textbook is:
ni=NcNve−Eg/2kT
where Nc and Nv are the effective density of states in the conduction and valence bands, Eg is the bandgap energy, k is Boltzmann's constant, and T is absolute temperature.
This isn't pulled from thin air. It comes from a simple physical balance: in an intrinsic semiconductor, every electron in the conduction band leaves behind a hole in the valence band. So the electron concentration n must equal the hole concentration p, and both equal ni.
Step 1: The electron and hole concentrations individually
Electrons in the conduction band follow Fermi-Dirac statistics. For non-degenerate semiconductors (which intrinsic ones are, since the Fermi level lies near midgap), the distribution approximates the Maxwell-Boltzmann tail:
n=Nce−(Ec−EF)/kT
Similarly, holes in the valence band:
p=Nve−(EF−Ev)/kT
Here Ec is the conduction band edge, Ev is the valence band edge, and EF is the Fermi level. The effective densities Nc and Nv come from integrating the density of states times the Boltzmann factor — they depend on the effective masses of electrons and holes and on temperature.
Step 2: The intrinsic condition
In an intrinsic semiconductor, there are no dopants. Every electron that jumps to the conduction band creates exactly one hole. So:
n=p
Set the two expressions equal:
Nce−(Ec−EF)/kT=Nve−(EF−Ev)/kT
Take natural logs and solve for EF:
−(Ec−EF)+lnNc=−(EF−Ev)+lnNv
EF=2Ec+Ev+2kTlnNcNv
The Fermi level in an intrinsic semiconductor sits very close to the middle of the bandgap, shifted slightly by the ratio Nv/Nc. For most practical purposes, it's at midgap.
Step 3: Multiply to eliminate EF
Now here's the clever part. Instead of solving for EF directly, multiply n and p:
np=NcNve−(Ec−EF)/kTe−(EF−Ev)/kT
The EF terms cancel:
np=NcNve−(Ec−Ev)/kT=NcNve−Eg/kT
This product np is a constant for a given material at a given temperature — it does not depend on the Fermi level. This is the law of mass action for semiconductors.
Step 4: Apply the intrinsic condition
Since n=p=ni in an intrinsic semiconductor:
ni2=NcNve−Eg/kT
Take the square root:
ni=NcNve−Eg/2kT
The factor of 1/2 in the exponent comes directly from the square root — it's not an arbitrary fudge. Physically, it reflects that creating an electron-hole pair requires energy Eg, but the probability of that event involves both an electron being excited and a hole being left behind, each contributing half the Boltzmann factor.
Why this formula makes physical sense
- Bandgap Eg: A larger gap means fewer electrons can be thermally excited across it — ni drops exponentially.
- Temperature T: Higher temperature gives more thermal energy, so ni rises sharply (the exponential dominates).
- Effective masses (through Nc and Nv): Materials with heavier carriers have more states near the band edges, so ni is larger.
A common mistake is to think ni depends on doping. It does not — ni is a material property at a given temperature. Doping changes n and p individually, but their product np always equals ni2 at equilibrium.
The temperature dependence in practice
For silicon at 300 K, ni≈1.5×1010 cm−3. For germanium, it's about 2.4×1013 cm−3 — the smaller bandgap (0.67 eV vs 1.12 eV) makes a huge difference. For gallium arsenide (1.43 eV), ni is only about 2×106 cm−3.
The formula ni=NcNve−Eg/2kT is the foundation for understanding pn junctions, transistors, and essentially all semiconductor device physics. It's not just a memorised equation — it's the direct consequence of thermal equilibrium and the requirement that charge neutrality holds in a pure crystal.
The key idea is that in a semiconductor, thermal energy excites electrons from the valence band to the conduction band, creating electron-hole pairs. This increases the number density of free charge carriers.
Reasoning:
- As temperature rises, more covalent bonds break, generating more free electrons and holes. The number density of carriers (n) increases exponentially.
- Relaxation time (τ) — the average time between collisions — actually decreases with temperature because lattice vibrations (phonons) scatter carriers more strongly.
- The increase in n dominates over the decrease in τ, so conductivity σ=neμ (where μ∝τ) still rises overall.
Option (C) is wrong because relaxation time does not increase with temperature — it decreases.
The correct option is (D): number density of carriers increases, relaxation time decreases, but the effect of the decrease in relaxation time is much less than the increase in number density.
In an N-type semiconductor, doping creates extra electrons, but at higher temperatures, more covalent bonds break, dramatically increasing the number of free charge carriers. The relaxation time (average time between collisions) actually decreases with temperature due to increased lattice vibrations. The net effect is a rise in conductivity because the increase in carrier density far outweighs the decrease in relaxation time. The correct option is (D).
Why This Question Tests a Key Insight
Many students memorise that "conductivity increases with temperature for semiconductors" but miss the why. The trap is thinking that both factors — number of carriers and relaxation time — move in the same direction. They don't. Let's unpack the physics.
In an N-type semiconductor at room temperature, most conduction comes from donor electrons (from pentavalent impurities like phosphorus). But as temperature rises, something more dramatic happens: thermal energy becomes large enough to break covalent bonds in the silicon or germanium lattice itself. Each broken bond creates an electron-hole pair. This is called intrinsic carrier generation, and it floods the material with both electrons and holes.
So the number density of free carriers (n) rises sharply with temperature. That alone would increase conductivity.
But what about relaxation time (τ)? That's the average time an electron travels between collisions. As temperature increases, lattice atoms vibrate more vigorously (phonon scattering increases). Electrons bump into these vibrations more often, so τ decreases.
The conductivity formula ties both together:
σ=neμ=ne(m∗eτ)=m∗ne2τ
Here μ is mobility, e is electron charge, m∗ is effective mass. So σ∝nτ. If n increases and τ decreases, which one wins?
Step-by-Step Reasoning
-
At low to moderate temperatures, the donor electrons are already ionised, so n is roughly constant (equal to donor concentration ND). But τ decreases with temperature because lattice scattering intensifies. So conductivity decreases slightly with temperature in this range — a fact many miss.
-
At higher temperatures (typically above ~400 K for silicon), intrinsic carrier generation kicks in. The number density n grows exponentially with temperature, roughly as n∝T3/2e−Eg/(2kT), where Eg is the band gap energy. This exponential rise is enormous.
-
Relaxation time behaves as τ∝T−3/2 for lattice scattering (the dominant mechanism at high temperatures). So τ decreases as a power law, not exponentially.
-
Compare the rates: The exponential increase in n completely overwhelms the power-law decrease in τ. For example, raising temperature from 300 K to 400 K might increase n by a factor of 1000, while τ drops by only a factor of about 1.5. The product nτ — and hence σ — increases strongly.
A common mistake is to think both n and τ increase with temperature. In fact, τ always decreases with temperature in semiconductors because scattering by lattice vibrations (phonons) becomes more frequent. The increase in conductivity is despite the drop in τ, not because of it.
- Option analysis:
- (A) "Number density of free current carriers increases" — true, but incomplete. It ignores the relaxation time change.
- (B) "Relaxation time increases" — false. Relaxation time decreases.
- (C) "Both increase" — false for the same reason.
- (D) "Number density increases, relaxation time decreases but effect of decrease in relaxation time is much less than increase in number density" — this is exactly what happens.
A quick way to remember: In metals, conductivity decreases with temperature because n is fixed (electron sea) and τ drops. In semiconductors, the exponential explosion of n from bond-breaking dominates, so conductivity increases. The key difference is the availability of a mechanism (band-to-band excitation) that can massively multiply carriers.
The correct option is (D) — number density of current carriers increases, relaxation time decreases, but the increase in number density dominates, causing net conductivity to rise with temperature.
Method: Weighing Two Opposing Temperature Effects
Conductivity depends on two separate things: how MANY free carriers there are, and how EASILY they move between collisions. Temperature affects both, but in opposite directions -- so the question is really "which effect wins?"
Step 1 -- What happens to the number of carriers as T rises.
Thermal energy breaks covalent bonds in the lattice, freeing more electron-hole pairs. This effect is strong: raising the temperature noticeably generates a large number of new carriers, so the carrier density n rises sharply.
Step 2 -- What happens to how easily carriers move as T rises.
As the lattice heats up, atoms vibrate more, so a moving carrier collides with the lattice more often. The average time between collisions (relaxation time) therefore falls as T rises -- carriers are scattered more frequently, not less.
Step 3 -- Compare which effect dominates.
The rise in carrier density with temperature is a much steeper effect than the fall in relaxation time. So even though carriers are individually scattered a bit more often, there are so many more of them that the net conductivity still goes up.
Step 4 -- Match to the options.
- (A) only mentions the carrier-density rise, missing that relaxation time also changes -- incomplete.
- (B) and (C) both claim relaxation time increases -- this is backwards; it decreases.
- (D) states both effects correctly and says the density rise dominates -- this matches the physics.
Final answer: Option (D) -- carrier density increases, relaxation time decreases, but the density increase dominates, so conductivity rises with temperature.
- TG EAPCET 2026Set eng-2026-05-11-AN1 markMCQQ.If the potential difference across the ends of a copper wire of 100 cm length is 2 V and the conductivity of copper is 5.95×107 Sm−1, then the current per unit area (in A m−2) of the conductor is (A) 1.19×108 (B) 2.975×107 (C) 2.38×106 (D) 1.487×107
›Reveal solutionSolution
The current density is found using Ohm’s law in terms of conductivity and electric field: J=σE. With E=V/L, we get J=σLV=1.19×108 Am−2, so the correct option is (A).
Concept & Intuition
The question asks for current per unit area, which is the current density J. Instead of first finding total current and then dividing by area, we can use the microscopic form of Ohm’s law:
J=σE
where σ is conductivity and E is the electric field inside the wire. This is much more direct because we already know the potential difference and length, so the electric field is simply E=V/L. No need to involve resistance, resistivity, or cross-sectional area at all.
Step-by-step solution
-
Identify the given quantities
- Length of wire: L=100 cm=1.00 m
- Potential difference: V=2 V
- Conductivity: σ=5.95×107 Sm−1 (Siemens per metre, equivalent to Ω−1m−1)
-
Find the electric field inside the wire
For a uniform wire, the electric field is constant and given by
E=LV=1.00 m2 V=2 V/m
- Apply the microscopic Ohm’s law Current density J is the product of conductivity and electric field:
J=σE=(5.95×107)×2
- Calculate
J=1.19×108 Am−2
- Match with the options This value corresponds exactly to option (A).
TipA common mistake is to first compute resistance using R=σAL and then current via I=V/R, only to divide by A again. That extra step cancels out — the direct route J=σV/L is simpler and avoids handling the unknown area.
Watch outWatch the units: length must be in metres (100 cm = 1 m), not centimetres. Using 100 m would give a wildly wrong answer.
✓Final answerThe correct option is (A).
ANSWER: A
-
- TG EAPCET 2024Set eng-2024-05-10-FN1 markMCQQ.A conductor of length 1.5 m and area of cross-section 3×10−5 m2 has electrical resistance of 15 Ω. The current density in the conductor for an electric field of 21 Vm−1 is (A) 0.7×106 Am−2 (B) 0.7×10−6 Am−2 (C) 0.7×10−5 Am−2 (D) 0.7×105 Am−2
›Reveal solutionSolution
ρ=RA/l=3×10−4 Ω m, so J=E/ρ=21/(3×10−4)=0.7×105 Am−2 — option (D).
Concept. The vector (microscopic) form of Ohm's law relates current density to the applied electric field through the material's conductivity: J=σE=E/ρ. The resistivity comes from the sample's dimensions via R=ρl/A.
Step 1 — find the resistivity.
ρ=lRA=1.5 m15 Ω×3×10−5 m2=3×10−4 Ωm.
Step 2 — apply J=E/ρ.
J=ρE=3×10−4 Ωm21 Vm−1=7×104 Am−2=0.7×105 Am−2.
Check via current: V=El=21×1.5=31.5 V, I=V/R=2.1 A, J=I/A=2.1/(3×10−5)=7×104 Am−2 ✓ — same result.
✓Final answerJ=0.7×105 Am−2 — the correct option is (D).
ANSWER: D
- TG EAPCET 2023Set ap-2023-05-11-AN1 markMCQQ.In a CE transistor amplifier, when a signal of 25 mV is added to the base-emitter voltage, the collector current changes by 2 mA. If the load resistance is 5 kΩ, the voltage gain of the amplifier is (A) 10 (B) 25 (C) 100 (D) 400
›Reveal solutionSolution
The voltage gain of a CE transistor amplifier is the ratio of the change in output voltage to the change in input voltage. By calculating the change in output voltage across the load resistance due to the change in collector current, and dividing it by the given change in base-emitter voltage, we find the voltage gain to be 400.
In a Common Emitter (CE) transistor amplifier, a small change in the input base-emitter voltage (ΔVBE) causes a significant change in the collector current (ΔIC). This change in collector current then flows through a load resistance (RL) connected in the collector circuit, producing a large change in the output voltage (ΔVCE or ΔVout). The voltage gain (Av) of the amplifier is a measure of how much the amplifier increases the voltage of the input signal, defined as the ratio of the change in output voltage to the change in input voltage.
The core idea is that the transistor acts as a current amplifier, where a small base current change (driven by ΔVBE) leads to a larger collector current change. This amplified current change, when passed through a load resistor, converts back into a significantly amplified voltage change at the output.
Here's how to calculate the voltage gain:
-
Identify the input voltage change:
The problem states that a signal of 25 mV is added to the base-emitter voltage. This is our input voltage change, ΔVin.
ΔVin=ΔVBE=25 mV=25×10−3 V.
-
Determine the change in output current:
The problem states that the collector current changes by 2 mA. This is the change in current flowing through the load resistance.
ΔIC=2 mA=2×10−3 A.
-
Identify the load resistance:
The load resistance in the collector circuit is given as 5 kΩ.
RL=5 kΩ=5×103 Ω.
-
Calculate the change in output voltage:
The change in output voltage (ΔVout) is the voltage developed across the load resistance due to the change in collector current. Using Ohm's Law:
ΔVout=ΔIC×RL
ΔVout=(2×10−3 A)×(5×103 Ω)
ΔVout=10 V
-
Calculate the voltage gain:
The voltage gain (Av) is defined as the ratio of the change in output voltage to the change in input voltage.
Av=ΔVinΔVout
Substitute the calculated values:
Av=25×10−3 V10 V
Av=0.02510
Av=2510000
Av=400
Watch outEnsure consistent units. Convert all given values to SI units (Volts, Amperes, Ohms) before performing calculations to avoid errors. Forgetting to convert millivolts or kilo-ohms can lead to incorrect results.
✓Final answerThe voltage gain of the amplifier is 400.
-
- TG EAPCET 2023Set eng-2023-05-13-AN1 markMCQQ.The nucleus 50120X undergoes the series of reactions given below:
[!FORMULA] ZAXα-decayPβ-decayQα-decayR
The number of neutrons in the nucleus R is (A) A−5 (B) A−Z−5 (C) A−9 (D) A−Z−4›Reveal solutionSolution
Two α's and one β− take (A,Z) to (A−8, Z−3); the neutron number is therefore (A−8)−(Z−3)=A−Z−5 — option (B).
The concept first: conservation is all you need
Every decay is bookkeeping on two conserved quantities — mass number A (nucleons) and charge/atomic number Z (protons):
- α-decay ejects a X24X2224He nucleus: A→A−4,Z→Z−2.
- β−-decay turns a neutron into a proton and ejects an electron: A→A (unchanged), Z→Z+1.
And the quantity actually asked for, the neutron number, is never listed on the symbol — you compute it as
N=A−Z.
That last line is where most marks are lost: students correctly find R's A and Z and then quote A instead of A−Z.
Step-by-step
Step 1 — First α-decay (X→P).
ZAX⟶Z−2A−4P+24He
Step 2 — β−-decay (P→Q). Mass number frozen, Z climbs by one:
Z−2A−4P⟶Z−1A−4Q+β−+νˉ
Step 3 — Second α-decay (Q→R).
Z−1A−4Q⟶Z−3A−8R+24He
Step 4 — Read off R's numbers.
AR=A−8,ZR=Z−3
Step 5 — Convert to neutrons.
NR=AR−ZR=(A−8)−(Z−3)=A−Z−8+3=A−Z−5
Step 6 — Numerical check with the stem's 50120X. Then A−Z−5=120−50−5=65. Verify directly: R would be 47112R, whose neutron count is 112−47=65 ✓ — the two routes agree.
(Option (C), A−9, is the classic slip of forgetting to subtract Z; option (A) forgets it too.)
✓Final answerR contains A−Z−5 neutrons, so the correct option is (B).
ANSWER: B
- TG EAPCET 2022Set eng-2022-07-18-AN1 markMCQQ.Consider a nucleus X3060X230260X. It's approximate density is (Take 1 amu=1.6×10−27 kg, R0=1.2×10−15 m.) (A) 1.2×1018 kg/m3 (B) 8.5×1019 kg/m3 (C) 3.3×1016 kg/m3 (D) 2.2×1017 kg/m3
›Reveal solutionSolution
The density of a nucleus is approximately constant for all nuclei, independent of its mass number. This is because the nuclear volume is proportional to the mass number, and the nuclear mass is also proportional to the mass number, causing these terms to cancel out in the density calculation. For the given nucleus, the approximate density is 2.2×1017 kg/m3.
The density of a nucleus is a fundamental property that reveals much about the strong nuclear force and the packing of nucleons (protons and neutrons) within the nucleus. A key insight in nuclear physics is that nuclear matter is incredibly dense and, remarkably, its density is nearly constant across all nuclei, irrespective of their size or mass number.
This constancy arises from two main observations:
- Nuclear Mass: The mass of a nucleus is approximately proportional to its mass number (A), which is the total number of protons and neutrons. Each nucleon has roughly the same mass, approximately 1 atomic mass unit (amu). So, the total mass M≈A×(1 amu).
- Nuclear Volume: Experimental evidence shows that the radius (R) of a nucleus is approximately proportional to the cube root of its mass number (A1/3). Since the nucleus is roughly spherical, its volume (V) is proportional to R3, which means V∝(A1/3)3∝A.
When we calculate density (ρ=M/V), the proportionality to A in both the numerator (mass) and the denominator (volume) cancels out. This leaves us with a density that is independent of A, meaning all nuclei have roughly the same density.
The radius of a nucleus with mass number A is given by R=R0A1/3, where R0 is an empirical constant.
Let's calculate the approximate density for the given nucleus X3060X230260X.
-
Identify the mass number and given constants:
The nucleus is X3060X230260X. The superscript 60 is the mass number (A).
So, A=60.
We are given:
Mass of 1 amu =1.6×10−27 kg
R0=1.2×10−15 m
-
Calculate the approximate mass of the nucleus:
The mass of a nucleus is approximately the mass number multiplied by the mass of one nucleon (which is approximately 1 amu).
M=A×(1 amu)
M=60×(1.6×10−27 kg)
M=96×10−27 kg
-
Calculate the volume of the nucleus:
First, find the radius of the nucleus using the formula R=R0A1/3.
R=(1.2×10−15 m)×(60)1/3
Since 601/3≈3.91,
R≈(1.2×10−15 m)×3.91
R≈4.692×10−15 m
Now, calculate the volume of the nucleus, assuming it is a sphere:
V=34πR3
V=34π(4.692×10−15 m)3
V≈34×3.14159×(4.692)3×(10−15)3 m3
V≈34×3.14159×103.1×10−45 m3
V≈431.6×10−45 m3
V≈4.316×10−43 m3
TipA more elegant way to calculate the volume is to substitute R=R0A1/3 directly into the volume formula:
V=34π(R0A1/3)3=34πR03A.
This shows explicitly how the volume is proportional to A.
V=34π(1.2×10−15 m)3×60
V=34π(1.728×10−45 m3)×60
V=4×π×0.576×10−45×60 m3
V≈4×3.14159×0.576×60×10−45 m3
V≈434.29×10−45 m3≈4.34×10−43 m3.
The slight difference is due to rounding 601/3. Using the direct substitution is more accurate.
-
Calculate the density of the nucleus:
Density ρ=VolumeMass
ρ=VM=34πR03AA×(1 amu)
Notice that the mass number A cancels out, confirming that the nuclear density is approximately constant for all nuclei.
ρ=34πR031 amu
Now, substitute the given values:
ρ=34π(1.2×10−15 m)31.6×10−27 kg
ρ=34π(1.728×10−45 m3)1.6×10−27 kg
ρ=4×3.14159×0.576×10−451.6×10−27
ρ=7.238×10−451.6×10−27
ρ≈0.221×10(−27−(−45))
ρ≈0.221×1018 kg/m3
ρ≈2.21×1017 kg/m3
-
Compare with the given options:
(A) 1.2×1018 kg/m3
(B) 8.5×1019 kg/m3
(C) 3.3×1016 kg/m3
(D) 2.2×1017 kg/m3
Our calculated value matches option (D).
✓Final answerThe approximate density of the nucleus X3060X230260X is 2.2×1017 kg/m3.
- TG EAPCET 2022Set eng-2022-07-19-FN1 markMCQQ.Current I through a given p-n junction when a voltage V is applied across it is given to be I=I0(eVTV−1) where I0 and VT are constants. If rd(I) is the dynamic resistance of the junction, then rd(1000I0)=αrd(10I0), where α is approximately equal to (A) 10 (B) 1/10 (C) 1/100 (D) 1/1000
›Reveal solutionSolution
Dynamic resistance is the reciprocal of the slope of the I–V curve. For a diode obeying I=I0(eV/VT−1), rd scales inversely with current, so rd(1000I0)≈1001rd(10I0), making α≈1/100.
The dynamic resistance rd of a p-n junction is defined as the small-signal resistance at a given operating point: it is the ratio of a small change in voltage to the resulting change in current, i.e. rd=dIdV. Physically, it tells you how much the voltage must shift to produce a unit current change around that bias — the steeper the I–V curve, the smaller the dynamic resistance.
For the given diode equation I=I0(eV/VT−1), the exponential term dominates once V is more than a few VT above zero, so I≈I0eV/VT. The dynamic resistance then follows directly from differentiation.
- Differentiate the current expression with respect to V:
dVdI=I0⋅VT1eV/VT=VTI+I0
Since I≫I0 for any forward bias of interest, dVdI≈VTI.
- The dynamic resistance is the reciprocal:
rd=dIdV≈IVT
This is the key result: dynamic resistance is inversely proportional to the current.
- Now evaluate at the two given currents:
rd(10I0)≈10I0VT,rd(1000I0)≈1000I0VT
- The ratio is:
rd(10I0)rd(1000I0)=VT/(10I0)VT/(1000I0)=100010=1001
Hence α=1/100.
Watch outA common mistake is to treat dynamic resistance like static resistance R=V/I. Static resistance falls much more slowly with current; dynamic resistance drops as 1/I, which is far faster. Always differentiate — don’t confuse the two.
TipOnce you know rd≈VT/I for a forward-biased diode, you can read off ratios instantly: doubling the current halves rd, multiplying current by 100 divides rd by 100, etc. This is a powerful shortcut for multiple-choice questions.
✓Final answerThe value of α is approximately 1/100, which corresponds to option (C).
- TG EAPCET 2021Set eng-2021-08-04-AN1 markMCQQ.In a p-n junction, an electric field of 5×105 V/m exists in the depletion region. The minimum kinetic energy of a conduction electron, in order to diffuse from n-side to the p-side, is found to be 3.2×10−20 J. The width of the depletion region is (A) 2×10−4 cm (B) 8×10−5 cm (C) 5×10−6 cm (D) 4×10−5 cm
›Reveal solutionSolution
To diffuse from the n-side to the p-side, a conduction electron must overcome the potential energy barrier created by the electric field in the depletion region. This barrier energy is equal to the minimum kinetic energy the electron possesses. By equating the given kinetic energy to the work done by the electric field on the electron, we find the width of the depletion region to be 4×10−5 cm.
Concept and Intuition
In a p-n junction, a depletion region forms at the interface between the p-type and n-type semiconductors. This region is depleted of mobile charge carriers (electrons and holes) and contains immobile positive donor ions on the n-side and negative acceptor ions on the p-side. These fixed charges create an electric field that points from the n-side (positive ions) to the p-side (negative ions).
This electric field establishes a potential barrier across the depletion region. For an electron, which is negatively charged, moving from the n-side to the p-side means moving against the direction of the electric field. To do this, the electron must gain potential energy, or equivalently, it must do work against the electric field. This work done against the electric field is supplied by the electron's kinetic energy.
Therefore, the minimum kinetic energy an electron must possess to successfully cross the depletion region from the n-side to the p-side is exactly equal to the potential energy barrier it needs to overcome. This potential energy barrier is the work done by the electric field on the electron as it traverses the entire width of the depletion region.
Step-by-step Solution
-
Identify the given quantities:
- Electric field strength in the depletion region, E=5×105 V/m.
- Minimum kinetic energy of a conduction electron to diffuse from n-side to p-side, KEmin=3.2×10−20 J.
- The charge of an electron, q=e=1.6×10−19 C.
-
Relate kinetic energy to potential energy barrier:
For an electron to move from the n-side to the p-side, it must overcome the potential energy barrier created by the electric field in the depletion region. The minimum kinetic energy required for this process is equal to the potential energy barrier.
Let ΔU be the potential energy barrier. Then, KEmin=ΔU.
-
Express potential energy barrier in terms of electric field and depletion width:
The potential energy barrier ΔU for a charge q moving across a potential difference ΔV is given by ΔU=qΔV.
In a region with a uniform electric field E and width d, the potential difference ΔV across this region is given by ΔV=Ed.
Therefore, the potential energy barrier is ΔU=qEd.
The potential energy barrier for a charge q across a depletion region of width d with a uniform electric field E is:
ΔU=qEd
-
Set up the equation and solve for the width d:
Equating the minimum kinetic energy to the potential energy barrier:
KEmin=qEd
We need to find the width d. Rearranging the formula:
d=qEKEmin
-
Substitute the given values and calculate d:
d=(1.6×10−19 C)×(5×105 V/m)3.2×10−20 J
d=8.0×10−143.2×10−20 m
d=0.4×10−20−(−14) m
d=0.4×10−6 m
d=4×10−7 m
-
Convert the width to centimeters:
Since 1 m=100 cm=102 cm:
d=4×10−7×102 cm
d=4×10−5 cm
Comparing this result with the given options, it matches option (D).
✓Final answerThe width of the depletion region is 4×10−5 cm.
-
- TG EAPCET 2021Set eng-2021-08-06-FN1 markMCQQ.Which of the following is correct with respect to the following statements? Due to diffusion of electrons from n to p – side ____ (I) electrons are accumulated in the depletion region (II) electron drift current is from p – side to n – side (III) an ionised donor is left in the n – region (IV) electrons of n – side comes to p – side and electron–hole combination takes in p – side Select the correct option from the following. (A) (I) and (II) (B) (I) and (III) (C) (I) and (IV) (D) (II), (III) and (IV)
›Reveal solutionSolution
When a p-n junction forms, electrons diffuse from the n-side to the p-side, leaving behind ionised donors in the n-region and recombining with holes in the p-region. This diffusion also creates an electric field that drives an electron drift current from the p-side to the n-side. Statements (II), (III), and (IV) are correct.
Concept and Intuition
A p-n junction is formed when a p-type semiconductor is brought into intimate contact with an n-type semiconductor. At the moment of formation, there's a significant difference in the concentration of charge carriers across the junction:
- The n-side has a high concentration of free electrons (majority carriers) and a low concentration of holes (minority carriers).
- The p-side has a high concentration of holes (majority carriers) and a low concentration of free electrons (minority carriers).
This concentration gradient drives a process called diffusion.
- Electron Diffusion: Electrons from the n-side (high concentration) start moving across the junction to the p-side (low concentration).
- Hole Diffusion: Similarly, holes from the p-side (high concentration) start moving across the junction to the n-side (low concentration).
As electrons diffuse from the n-side to the p-side, they leave behind positively charged, immobile donor ions in the n-region. As holes diffuse from the p-side to the n-side, they leave behind negatively charged, immobile acceptor ions in the p-region. This region, now containing immobile ions and depleted of free charge carriers, is called the depletion region.
The separation of these immobile charges creates an internal electric field across the depletion region, pointing from the n-side (positive ions) to the p-side (negative ions). This electric field opposes further diffusion and also causes a drift of minority carriers.
Let's analyze each statement based on these principles.
Step-by-Step Analysis
-
Analyze Statement (I): electrons are accumulated in the depletion region
- When electrons diffuse from the n-side to the p-side, they leave behind positively charged, immobile donor ions in the n-side of the depletion region.
- Similarly, holes diffusing from the p-side to the n-side leave behind negatively charged, immobile acceptor ions in the p-side of the depletion region.
- The depletion region is defined by the presence of these immobile ions and the absence of free charge carriers (electrons and holes). It is depleted of free carriers, not accumulated with them.
- Therefore, statement (I) is incorrect.
-
Analyze Statement (II): electron drift current is from p – side to n – side
- The diffusion of majority carriers (electrons from n to p, holes from p to n) creates an electric field (E) across the depletion region. This electric field points from the positively charged n-side to the negatively charged p-side.
- This electric field exerts a force on any free charge carriers.
- Minority electrons present in the p-side are pushed by this electric field towards the n-side.
- This movement of minority electrons constitutes an electron drift current from the p-side to the n-side.
- Therefore, statement (II) is correct.
-
Analyze Statement (III): an ionised donor is left in the n – region
- In an n-type semiconductor, donor atoms contribute free electrons. When an electron from a donor atom diffuses from the n-side to the p-side, it leaves behind its parent donor atom.
- Since the donor atom has lost an electron, it becomes a positively charged, immobile ion (D+). These immobile ions form the positive charge region on the n-side of the depletion layer.
- Therefore, statement (III) is correct.
-
Analyze Statement (IV): electrons of n – side comes to p – side and electron–hole combination takes in p – side
- This statement describes the initial diffusion process and subsequent recombination.
- Electrons from the n-side (where they are majority carriers) move across the junction to the p-side (where they become minority carriers). This is the diffusion of electrons.
- Once these electrons are in the p-side, they encounter a high concentration of holes (majority carriers in the p-side).
- These diffused electrons combine with holes, a process known as electron-hole recombination. This recombination reduces the number of free electrons and holes in the vicinity of the junction.
- Therefore, statement (IV) is correct.
Based on our analysis, statements (II), (III), and (IV) are correct.
✓Final answerThe correct option is (D) because statements (II), (III) and (IV) are correct.
🎓Unlock everything free for 14 days
- ✓Full step-by-step solutions
- ✓Concept-first explanations
- ✓Methods, shortcuts & mistakes
- ✓PYQ mapping + timed mock tests
Full access for 14 days. No credit card required.