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Q.At a certain temperature in an intrinsic semiconductor, the electron and hole concentration is 1.5×1016 m−31.5\times10^{16}\ \text{m}^{-3}. When it is doped with a trivalent dopant, the hole concentration increases to 4.5×1022 m−34.5\times10^{22}\ \text{m}^{-3}. In the doped semiconductor, the concentration of electrons (ne)(n_e) will be :

(a) 3×106 m−33\times10^{6}\ \text{m}^{-3}
(b) 5×107 m−35\times10^{7}\ \text{m}^{-3}
(c) 5×109 m−35\times10^{9}\ \text{m}^{-3}
(d) 6.75×1038 m−36.75\times10^{38}\ \text{m}^{-3}
CBSECBSE Class XII Board 2023MCQ· 1mImportance★★★★★
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The mass-action law states that ne⋅nh=ni2n_e \cdot n_h = n_i^2 holds even after doping. Using the intrinsic carrier concentration ni=1.5×1016 m−3n_i = 1.5 \times 10^{16}\ \text{m}^{-3} and the new hole concentration nh=4.5×1022 m−3n_h = 4.5 \times 10^{22}\ \text{m}^{-3}, we find ne=5×109 m−3n_e = 5 \times 10^{9}\ \text{m}^{-3}.

Understanding the Mass-Action Law

In an intrinsic semiconductor at thermal equilibrium, electrons and holes are created in pairs through thermal excitation across the band gap. The product of their concentrations defines the intrinsic carrier concentration squared: ni2=ne⋅nhn_i^2 = n_e \cdot n_h.

Here's the beautiful part: when you dope the semiconductor, you dramatically change the individual carrier concentrations, but the product ne⋅nhn_e \cdot n_h remains equal to ni2n_i^2 at that temperature. This is the mass-action law, a consequence of detailed balance in the generation-recombination processes.

When a trivalent dopant (like boron in silicon) is added, it creates acceptor levels that capture electrons, leaving behind holes. The semiconductor becomes p-type, with hole concentration shooting up. But those extra holes suppress the electron concentration through increased recombination — the product stays constant.

Step-by-Step Solution

  1. Extract the intrinsic carrier concentration

    In the intrinsic semiconductor, ne=nh=1.5×1016 m−3n_e = n_h = 1.5 \times 10^{16}\ \text{m}^{-3}.

    Therefore, the intrinsic carrier concentration is:

ni=1.5×1016 m−3n_i = 1.5 \times 10^{16}\ \text{m}^{-3}

and the mass-action constant at this temperature is:

ni2=(1.5×1016)2=2.25×1032 m−6n_i^2 = (1.5 \times 10^{16})^2 = 2.25 \times 10^{32}\ \text{m}^{-6}

  1. Identify the new hole concentration after doping

    After doping with the trivalent dopant, the hole concentration becomes:

nh=4.5×1022 m−3n_h = 4.5 \times 10^{22}\ \text{m}^{-3}

Notice this is about 3×1063 \times 10^6 times larger than the intrinsic value — the semiconductor is now heavily p-type.

  1. Apply the mass-action law

    Even in the doped semiconductor, the mass-action law holds:

ne⋅nh=ni2n_e \cdot n_h = n_i^2

Solving for the electron concentration: …

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