Q.How does the energy gap of an intrinsic semiconductor effectively change when doped with a
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Start your 14-day free trial to unlock the full solution →Doping introduces impurity energy levels inside the forbidden gap — an acceptor level just above the valence band (trivalent) or a donor level just below the conduction band (pentavalent). In both cases the energy gap is effectively reduced: free carriers can now be created with only – eV instead of the full gap ( eV for Si). The intrinsic band gap of the host crystal itself is not altered.
The Concept
The energy gap of an intrinsic semiconductor is the minimum energy needed to break a covalent bond and lift an electron from the valence band into the conduction band. In pure silicon this is about eV, so at room temperature only a tiny fraction of electrons make the jump — the pure crystal conducts poorly.
Doping does not rebuild the host lattice: the band edges and stay where they are. What doping does is insert new, localised energy levels inside the previously forbidden gap, very close to one band edge. Because carriers can now be created via these levels, the energy actually required drops from to the tiny impurity ionisation energy — the gap has effectively narrowed for carrier generation.
(a) Trivalent impurity (acceptor, p-type)
- A trivalent atom (boron, aluminium, indium) substituting a silicon atom forms only three covalent bonds; the fourth bond is incomplete — a vacancy ready to accept an electron.
- This introduces an acceptor energy level just above the valence band edge — about – eV above (for example eV for boron in silicon).
- Even room-temperature thermal energy lets valence-band electrons jump into these acceptor levels, leaving mobile holes in the valence band.
- Justification of the effective change: creating a hole now needs only – eV instead of the full eV. The energy gap has effectively decreased to the small acceptor ionisation energy.
(b) Pentavalent impurity (donor, n-type)
- A pentavalent atom (phosphorus, arsenic, antimony) forms four covalent bonds with its silicon neighbours; the fifth valence electron is only weakly bound to the impurity ion.
- This introduces a donor energy level just below the conduction band edge — about – eV below (for example eV for phosphorus in silicon).
- Room-temperature thermal energy readily ionises the donors, releasing these electrons into the conduction band as free carriers. …
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