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Question

Q.(a)

(i) A germanium crystal is doped with antimony. With the help of an energy-band diagram, explain how the conductivity of the doped crystal is affected.
(ii) Briefly explain the two processes involved in the formation of a p-n junction.
(iii) What will the effect of
(1) forward biasing, and
(2) reverse biasing be on the width of the depletion layer in a p-n junction diode ?
(OR)
(b)
(i) With the help of a circuit diagram, briefly explain the working of a full-wave rectifier using p-n junction diodes.
(ii) Draw the V–I characteristics of a p-n junction diode. Explain how these characteristics make a diode suitable for rectification.
(iii) Carbon and silicon have the same lattice structure. Then why is carbon an insulator but silicon a semiconductor ?
CBSECBSE Class XII Board 2023Subjective· 5mImportance★★★★★
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Figure — Stem (b)(i) 'With the help of a circuit diagram, briefly explain the working of a full-wave rectifier' require
Figure — Stem (b)(i) 'With the help of a circuit diagram, briefly explain the working of a full-wave rectifier' require

(a) Antimony makes Ge n-type (donor level near EcE_c) so conductivity rises; a p-n junction forms by diffusion then drift equilibrium; forward bias narrows and reverse bias widens the depletion layer. (b) A full-wave rectifier uses two diodes conducting on alternate half-cycles (output at 2f2f); the diode's asymmetric V–I curve makes it a one-way valve; carbon (Eg≈5.5E_g\approx5.5 eV) is an insulator while silicon (Eg≈1.1E_g\approx1.1 eV) is a semiconductor.

Part (a)

(i) Antimony-doped germanium

Antimony is pentavalent. Four of its valence electrons form covalent bonds with neighbouring Ge atoms; the fifth is very loosely bound and occupies a donor energy level EdE_d lying only ≈0.01\approx0.01 eV below the conduction-band edge EcE_c. At room temperature kBT≈0.026k_BT\approx0.026 eV easily ionises these donors, promoting electrons into the conduction band. The crystal becomes n-type (electrons are majority carriers), the electron density rises by orders of magnitude, and since σ=neμn+peμp\sigma=ne\mu_n+pe\mu_p with n≫pn\gg p, the conductivity increases greatly; the Fermi level moves up close to EcE_c.

(ii) Formation of a p-n junction

  1. Diffusion: electrons (abundant in n) and holes (abundant in p) diffuse down their concentration gradients across the junction and recombine, leaving behind immobile ionised dopants — positive donor ions on the n-side, negative acceptor ions on the p-side. This charged, carrier-free region is the depletion layer.
  2. Drift: the exposed ions set up a built-in electric field (n →\to p) that pushes carriers back — a drift current opposing diffusion. Equilibrium is reached when drift current exactly cancels diffusion current, establishing the barrier (built-in) potential V0V_0 (≈0.3\approx0.3 V for Ge).

(iii) Effect of biasing on depletion width

  • Forward bias lowers the barrier to V0−VV_0-V; the depletion layer narrows and a large forward current flows. …

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